Cl-based 플라즈마에 의한 YMnO3 박막의 식각 damage에 관한 연구
DC Field | Value | Language |
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dc.contributor.author | 박재화 | - |
dc.contributor.author | 김경태 | - |
dc.contributor.author | 김동표 | - |
dc.contributor.author | 김창일 | - |
dc.contributor.author | 장의구 | - |
dc.date.available | 2019-08-07T04:58:49Z | - |
dc.date.issued | 2003 | - |
dc.identifier.issn | 1226-7945 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/32212 | - |
dc.description.abstract | Ferroelectric YMnO3 thin films were etched with Ar/Cl2 and CF4/Cl2 inductivly coupled plasma (ICP). The maximum etch rate of YMnO3 thin film was 300 Å/min at a Ar/Cl2 gas mixing ratio of 2/8, a RF power of 800 W, a dc bias of 200 V, a chamber pressure of 15 mTorr, and a substrate temperature of 30 ºC. From the X-ray photoelectron spectroscopy (XPS) analysis, yttrium etched by chemical reactions with Cl radicals assisted by Ar ion bombardments in Ar/Cl2 plasma. In CF4/Cl2 plasma, yttrium are remained on the etched surface of YMnO3 and formed of nonvolatile YFx compounds Manganese etched effectively by chemical reactions with Cl and F radicals. From the X-ray diffraction (XRD) analysis, the (0004) diffraction peak intensity of the YMnO3 thin film etched in Ar/Cl2 plasma shows lower value than that in CF4/Cl2 plasma. It indicates that the crystallinty of YMnO3 thin film is more easily damaged by the Ar ion bombardment than the changes of stoichiometry due to nonvolatile etch by-products. | - |
dc.publisher | 한국전기전자재료학회 | - |
dc.title | Cl-based 플라즈마에 의한 YMnO3 박막의 식각 damage에 관한 연구 | - |
dc.title.alternative | Study on Etching Damages of YMnO3 Thin Films by Cl-based Plasma | - |
dc.type | Article | - |
dc.identifier.bibliographicCitation | 전기전자재료학회논문지, v.16, no.6 | - |
dc.identifier.kciid | ART001184543 | - |
dc.description.isOpenAccess | N | - |
dc.citation.number | 6 | - |
dc.citation.title | 전기전자재료학회논문지 | - |
dc.citation.volume | 16 | - |
dc.publisher.location | 대한민국 | - |
dc.subject.keywordAuthor | Ferroelectric | - |
dc.subject.keywordAuthor | YMnO3 | - |
dc.subject.keywordAuthor | ICP | - |
dc.subject.keywordAuthor | Damage | - |
dc.subject.keywordAuthor | Etching | - |
dc.description.journalRegisteredClass | kci | - |
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