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Results 1-3 of 3 (Search time: 0.005 seconds).
Inductively coupled Cl-2/O-2 plasma: experimental investigation and modelling
Efremov, AM; Kim, DP;
Kim, CI
Article
Issue Date
2004
Citation
VACUUM, v.75, no.3, pp 237 - 246
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
Simple model for ion-assisted etching using CL2-Ar inductively coupled plasma: Effect of gas mixing ratio
Efremov, AM; Kim, DP;
Kim, CI
Article
Issue Date
2004
Citation
IEEE TRANSACTIONS ON PLASMA SCIENCE, v.32, no.3, pp 1344 - 1351
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Effect of gas imixing ratio on gas-phase composition and etch rate in an inductively coupled CF4/Ar plasma
Efremov, AM; Kim, DP;
Kim, CI
Article
Issue Date
2004
Citation
VACUUM, v.75, no.2, pp 133 - 142
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
1
Discover
Author
Kim, Chang Il
3
Efremov, AM
3
Subject
CHLORINE PLASMAS
3
dissociation
3
GLOBAL-MODEL
3
MODULATED HIGH-DENSITY
3
CL-2-AR PLASMAS
2
CL-2/AR PLASMA
2
DISCHARGES
2
ELECTRON TEMPERATURES
2
LOW-PRESSURE
2
plasma
2
.
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Date Issued
2004
3
Type
Article
3
Language
ENG
3
Journal
VACUUM
2
IEEE TRANSACTIONS ON PLASMA SCIENCE
1
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