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Charge Transport Mechanism in p-Channel Tin Monoxide Thin-Film Transistors

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dc.contributor.authorKim, Hee-Joong-
dc.contributor.authorJeong, Chan-Yong-
dc.contributor.authorBae, Sang-Dae-
dc.contributor.authorLee, Jeong-Hwan-
dc.contributor.authorKwon, Hyuck-In-
dc.date.available2019-03-08T08:57:55Z-
dc.date.issued2017-04-
dc.identifier.issn0741-3106-
dc.identifier.issn1558-0563-
dc.identifier.urihttps://scholarworks.bwise.kr/cau/handle/2019.sw.cau/4612-
dc.description.abstractIn this letter, we report on the charge transport mechanism in the p-type tin monoxide (SnO) thin-film transistors (TFTs)over a wide range of operation regimes and temperatures. From the temperature-dependent field-effect conductance measurements, the variable range hopping and the trap-limited band transport are considered as dominant charge transport mechanisms in the SnO TFT at temperatures below similar to 200 K (-73 degrees C) and above similar to 273 K ( 0 degrees C), respectively, in the subthreshold and transition regions. In the above-threshold region, the intrinsic field-effect mobility (mu(FEi)) decreases with an increase in temperature with a prefactor. similar to-0.36 in the mu(FEi) similar to T-gamma. law at temperatures (Ts) between RT and 353 K ( 80 degrees C). The observed temperature and gate overdrive voltage dependence of mu(FEi) suggests that the acoustic phonon scatteringis the dominant physical mechanism limiting mu(FEi) in the p-type SnO TFT at realistic operating conditions [ in the above-threshold region and at temperatures ranging from RT to 353 K (80 degrees C)].-
dc.format.extent4-
dc.language영어-
dc.language.isoENG-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.titleCharge Transport Mechanism in p-Channel Tin Monoxide Thin-Film Transistors-
dc.typeArticle-
dc.identifier.doi10.1109/LED.2017.2672730-
dc.identifier.bibliographicCitationIEEE ELECTRON DEVICE LETTERS, v.38, no.4, pp 473 - 476-
dc.description.isOpenAccessN-
dc.identifier.wosid000398905400016-
dc.identifier.scopusid2-s2.0-85017588988-
dc.citation.endPage476-
dc.citation.number4-
dc.citation.startPage473-
dc.citation.titleIEEE ELECTRON DEVICE LETTERS-
dc.citation.volume38-
dc.type.docTypeArticle-
dc.publisher.location미국-
dc.subject.keywordAuthorP-type tin monoxide (SnO)-
dc.subject.keywordAuthorthin-film transistor-
dc.subject.keywordAuthorcharge transport mechanism-
dc.subject.keywordAuthorrealistic operating condition-
dc.subject.keywordAuthoracoustic phonon scattering-
dc.subject.keywordPlusMOBILITY-
dc.subject.keywordPlusPHASE-
dc.subject.keywordPlusMOSFETS-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.description.journalRegisteredClasssci-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
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