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Charge Transport Mechanism in p-Channel Tin Monoxide Thin-Film Transistors

Authors
Kim, Hee-JoongJeong, Chan-YongBae, Sang-DaeLee, Jeong-HwanKwon, Hyuck-In
Issue Date
Apr-2017
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Keywords
P-type tin monoxide (SnO); thin-film transistor; charge transport mechanism; realistic operating condition; acoustic phonon scattering
Citation
IEEE ELECTRON DEVICE LETTERS, v.38, no.4, pp 473 - 476
Pages
4
Journal Title
IEEE ELECTRON DEVICE LETTERS
Volume
38
Number
4
Start Page
473
End Page
476
URI
https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/4612
DOI
10.1109/LED.2017.2672730
ISSN
0741-3106
1558-0563
Abstract
In this letter, we report on the charge transport mechanism in the p-type tin monoxide (SnO) thin-film transistors (TFTs)over a wide range of operation regimes and temperatures. From the temperature-dependent field-effect conductance measurements, the variable range hopping and the trap-limited band transport are considered as dominant charge transport mechanisms in the SnO TFT at temperatures below similar to 200 K (-73 degrees C) and above similar to 273 K ( 0 degrees C), respectively, in the subthreshold and transition regions. In the above-threshold region, the intrinsic field-effect mobility (mu(FEi)) decreases with an increase in temperature with a prefactor. similar to-0.36 in the mu(FEi) similar to T-gamma. law at temperatures (Ts) between RT and 353 K ( 80 degrees C). The observed temperature and gate overdrive voltage dependence of mu(FEi) suggests that the acoustic phonon scatteringis the dominant physical mechanism limiting mu(FEi) in the p-type SnO TFT at realistic operating conditions [ in the above-threshold region and at temperatures ranging from RT to 353 K (80 degrees C)].
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창의ICT공과대학 (전자전기공학부)
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