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Multi-stacking Indium Zinc Oxide Thin-Film Transistors Post-annealed by Femtosecond LaserMulti-Stacking Indium Zinc Oxide Thin-Film Transistors Post-Annealed by Femtosecond Laser
- Issue Date
- Sep-2021
- Publisher
- KOREAN INST METALS MATERIALS
- Keywords
- Indium zinc oxide; Femtosecond laser; Solution-processed; Multi-stacked; Post-annealing process
- Citation
- ELECTRONIC MATERIALS LETTERS, v.17, no.5, pp 451 - 458
- Pages
- 8
- Journal Title
- ELECTRONIC MATERIALS LETTERS
- Volume
- 17
- Number
- 5
- Start Page
- 451
- End Page
- 458
- ISSN
- 1738-8090
2093-6788
- Abstract
- Indium zinc oxide thin-film transistors with a bottom gate structure were made by a channel layer multi-stack process on silicon substrate. Femtosecond laser post-annealing treatment was carried out to study the impact on the electrical properties and the stability of the device. The experimental results show that the electrical properties of the device are improved optimally when 100-s laser post-annealing treatment was carried out, and it had the best stability. The mobility was 5.23 cm(2)/Vs, the threshold voltage was - 0.26 V, the stable subthreshold swing was 0.81 V/dec, and the electron mobility of the device stayed above 3.82 cm(2)/Vs after it was exposed to air for 14 days.
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