Low-Frequency Noise in Amorphous Indium-Gallium-Zinc-Oxide Thin-Film Transistors

Abstract

We have investigated the low-frequency noise (LFN) properties of amorphous indium-gallium-zinc-oxide (a-IGZO) thin-film transistors (TFTs) as a function of frequency, bias, and channel length of devices. The measured noise power spectral density of drain current (S-iD) shows that the low-frequency noise in a-IGZO TFTs obeys the classical 1/f noise theory, i.e., it fits well to a 1/f(gamma) power law with gamma similar to 1 in the frequency range of 10 Hz to 1 kHz. From the dependence of normalized noise power spectral density (Si-D/I-D(2)) on the gate voltage, mobility fluctuation is considered as a dominant LFN mechanism in a-IGZO TFTs. The magnitude of Si-D/I-D(2) is inversely proportional to the channel length of devices, which indicates that contact noise is insignificant in a-IGZO TFTs.