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Exact locating of sub-surface microelectronic structures using scanning thermal wave microscopy

Authors
Chung, J.Kim, K.Hwang, G.Kwon, O.Lee, J.S.Park, S.Choi, Y.K.
Issue Date
2008
Keywords
Non-destructive evaluation (NDE); Phase lag; Scanning thermal microscopy (SThM); Scanning thermal wave microscopy (STWM); Thermal wave
Citation
Proceedings of SPIE - The International Society for Optical Engineering, v.7268
Journal Title
Proceedings of SPIE - The International Society for Optical Engineering
Volume
7268
URI
https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/52111
DOI
10.1117/12.810688
ISSN
0277-786X
Abstract
With the fast advance of ultra large scale integrated (ULSI) circuit technology, the need for sub-surface imaging technique to locate and characterize sub-surface defects in ULSI circuits has been growing. In this study we advance scanning thermal wave microscopy further so that the absolute phase lag of the thermal waves generated by an electrically heated sub-surface microelectronic structure buried in an ULSI circuit can be measured. The measurement of the absolute phase lag allowed exact locating of the vertical and horizontal position of buried microelectronic structures and evaluation of their soundness nondestructively. © 2008 SPIE.
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