Metal-Oxide Thin-Film Transistors for Flexible Electronics
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Y.-H. | - |
dc.contributor.author | Park, S.K. | - |
dc.date.accessioned | 2022-04-07T06:40:14Z | - |
dc.date.available | 2022-04-07T06:40:14Z | - |
dc.date.issued | 2015-01 | - |
dc.identifier.issn | 0000-0000 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/55982 | - |
dc.description.abstract | Flexible electronic devices have been extensively researched in industries and research institutions with an aim to create new conceptual electronics such as flexible and bendable devices. Metal-oxide (MO) semiconductors have attracted a great deal of interest because of their relatively high carrier mobility and better operational stability over amorphous silicon thin-film transistors (a-Si:H) and organic thin-film transistors (TFTs). The most intriguing advantages of using MO semiconductor TFTs in flat-panel displays is the large-area scalability by relatively simple fabrication processes compared to low-temperature polycrystalline silicon (LTPS) TFT technology. Vacuum deposition processes are now widely used in flat-panel display manufacturing, and sputtering technology is one of the most mature technologies among many other deposition techniques. Solution-processed MO TFT is becoming one of the essential technologies for future flexible electronics because of its high electrical performance with reasonable reliability. © 2015 Wiley-VCH Verlag GmbH & Co. KGaA. All rights reserved. | - |
dc.format.extent | 16 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | wiley | - |
dc.title | Metal-Oxide Thin-Film Transistors for Flexible Electronics | - |
dc.type | Article | - |
dc.identifier.doi | 10.1002/9783527679973.ch2 | - |
dc.identifier.bibliographicCitation | Large Area and Flexible Electronics, pp 101 - 116 | - |
dc.description.isOpenAccess | N | - |
dc.identifier.scopusid | 2-s2.0-84973890263 | - |
dc.citation.endPage | 116 | - |
dc.citation.startPage | 101 | - |
dc.citation.title | Large Area and Flexible Electronics | - |
dc.type.docType | Book Chapter | - |
dc.subject.keywordAuthor | Amorphous silicon thin-film transistors (a-Si:H) | - |
dc.subject.keywordAuthor | Flexible electronics | - |
dc.subject.keywordAuthor | Low-temperature polycrystalline silicon (LTPS) | - |
dc.subject.keywordAuthor | Metal-oxide (MO) semiconductors | - |
dc.subject.keywordAuthor | Solution-processing | - |
dc.subject.keywordAuthor | Sputtering technology | - |
dc.subject.keywordAuthor | Thin-film transistors (TFTs) | - |
dc.subject.keywordAuthor | Vacuum deposition | - |
dc.subject.keywordPlus | Amorphous films | - |
dc.subject.keywordPlus | Amorphous materials | - |
dc.subject.keywordPlus | Amorphous silicon | - |
dc.subject.keywordPlus | Field effect transistors | - |
dc.subject.keywordPlus | Flat panel displays | - |
dc.subject.keywordPlus | Flexible electronics | - |
dc.subject.keywordPlus | Metallic compounds | - |
dc.subject.keywordPlus | Metals | - |
dc.subject.keywordPlus | Polycrystalline materials | - |
dc.subject.keywordPlus | Polysilicon | - |
dc.subject.keywordPlus | Semiconducting silicon | - |
dc.subject.keywordPlus | Temperature | - |
dc.subject.keywordPlus | Thin film circuits | - |
dc.subject.keywordPlus | Thin films | - |
dc.subject.keywordPlus | Vacuum deposition | - |
dc.subject.keywordPlus | a-Si:H | - |
dc.subject.keywordPlus | Low temperature polycrystalline silicon | - |
dc.subject.keywordPlus | Metal oxides | - |
dc.subject.keywordPlus | Solution-processing | - |
dc.subject.keywordPlus | Sputtering technology | - |
dc.subject.keywordPlus | Thin film transistors (TFTs) | - |
dc.subject.keywordPlus | Thin film transistors | - |
dc.description.journalRegisteredClass | scopus | - |
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