Step bunching-induced vertical lattice mismatch and crystallographic tilt in vicinal BiFeO3(001) filmsopen access
- Authors
- Kim, T. H.; Baek, S. H.; Jang, S. Y.; Yang, S. M.; Chang, S. H.; Song, T. K.; Yoon, J. -G.; Eom, C. B.; Chung, J. -S.; Noh, T. W.
- Issue Date
- Jan-2011
- Publisher
- AMER INST PHYSICS
- Citation
- APPLIED PHYSICS LETTERS, v.98, no.2
- Journal Title
- APPLIED PHYSICS LETTERS
- Volume
- 98
- Number
- 2
- URI
- https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/56871
- DOI
- 10.1063/1.3535981
- ISSN
- 0003-6951
1077-3118
- Abstract
- Epitaxial (001) BiFeO3 thin films grown on vicinal SrTiO3 substrates are under large anisotropic stress from the substrates. The variations of the crystallographic tilt angle and the c lattice constant, caused by the lattice mismatch, along the film thickness were analyzed quantitatively using the x-ray diffraction technique. By generalizing the Nagai model, we estimated how step bunching resulted in the vertical lattice mismatch between adjacent BiFeO3 layers, which induced the strain relaxation and crystallographic tilt. The step bunching was confirmed by the increased terrace width on the BiFeO3 surface. (C) 2011 American Institute of Physics. [doi:10.1063/1.3535981]
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- Appears in
Collections - College of Natural Sciences > Department of Physics > 1. Journal Articles
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