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Abnormal Seebeck Effect in Vertically Stacked 2D/2D PtSe2/PtSe2 Homostructure

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dc.contributor.authorLee, Won-Yong-
dc.contributor.authorKang, Min-Sung-
dc.contributor.authorChoi, Jae Won-
dc.contributor.authorKim, Si-Hoo-
dc.contributor.authorPark, No-Won-
dc.contributor.authorKim, Gil-Sung-
dc.contributor.authorKim, Yun-Ho-
dc.contributor.authorSaitoh, Eiji-
dc.contributor.authorYoon, Young-Gui-
dc.contributor.authorLee, Sang-Kwon-
dc.date.accessioned2022-11-25T06:40:04Z-
dc.date.available2022-11-25T06:40:04Z-
dc.date.issued2022-12-
dc.identifier.issn2198-3844-
dc.identifier.issn2198-3844-
dc.identifier.urihttps://scholarworks.bwise.kr/cau/handle/2019.sw.cau/59299-
dc.description.abstractWhen a thermoelectric (TE) material is deposited with a secondary TE material, the total Seebeck coefficient of the stacked layer is generally represented by a parallel conductor model. Accordingly, when TE material layers of the same thickness are stacked vertically, the total Seebeck coefficient in the transverse direction may change in a single layer. Here, an abnormal Seebeck effect in a stacked two-dimensional (2D) PtSe2/PtSe2 homostructure film, i.e., an extra in-plane Seebeck voltage is produced by wet-transfer stacking at the interface between the PtSe2 layers under a transverse temperature gradient is reported. This abnormal Seebeck effect is referred to as the interfacial Seebeck effect in stacked PtSe2/PtSe2 homostructures. This effect is attributed to the carrier-interface interaction, and has independent characteristics in relation to carrier concentration. It is confirmed that the in-plane Seebeck coefficient increases as the number of stacked PtSe2 layers increase and observed a high Seebeck coefficient exceeding approximate to 188 mu V K-1 at 300 K in a four-layer-stacked PtSe2/PtSe2 homostructure.-
dc.language영어-
dc.language.isoENG-
dc.publisherWILEY-
dc.titleAbnormal Seebeck Effect in Vertically Stacked 2D/2D PtSe2/PtSe2 Homostructure-
dc.typeArticle-
dc.identifier.doi10.1002/advs.202203455-
dc.identifier.bibliographicCitationADVANCED SCIENCE, v.9, no.36-
dc.description.isOpenAccessY-
dc.identifier.wosid000880744900001-
dc.identifier.scopusid2-s2.0-85141967846-
dc.citation.number36-
dc.citation.titleADVANCED SCIENCE-
dc.citation.volume9-
dc.type.docTypeArticle-
dc.publisher.location미국-
dc.subject.keywordAuthorhomostructure-
dc.subject.keywordAuthorhot-carrier injection-
dc.subject.keywordAuthorin-plane Seebeck effect-
dc.subject.keywordAuthorinterfacial Seebeck effect-
dc.subject.keywordAuthorMott relation-
dc.subject.keywordAuthorplatinum diselenide-
dc.subject.keywordAuthorvan der Waals-
dc.subject.keywordPlusTHERMOELECTRIC FIGURE-
dc.subject.keywordPlusPTSE2-
dc.subject.keywordPlusENHANCEMENT-
dc.subject.keywordPlusPERFORMANCE-
dc.subject.keywordPlusMERIT-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalWebOfScienceCategoryChemistry, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
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