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Tuning resistive switching parameters in Si3N4-based RRAM for three-dimensional vertical resistive memory applications
- Authors
- Kim, Sungjun; Kim, Hyungjin; Jung, Sunghun; Kim, Min-Hwi; Lee, Sang-Ho; Cho, Seongjae; Park, Byung-Gook
- Issue Date
- Apr-2016
- Publisher
- ELSEVIER SCIENCE SA
- Keywords
- 3D vertical structure; Resistive random-access memory (RRAM); Silicon nitride (Si3N4); Film thickness; Compliance current
- Citation
- JOURNAL OF ALLOYS AND COMPOUNDS, v.663, pp 419 - 423
- Pages
- 5
- Journal Title
- JOURNAL OF ALLOYS AND COMPOUNDS
- Volume
- 663
- Start Page
- 419
- End Page
- 423
- ISSN
- 0925-8388
1873-4669
- Abstract
- In this work, new 3D vertical RRAM device with silicon CMOS compatibility and the possible fabrication process are presented. RRAM devices based on Ni/Si3N4/p(+)-Si stack which are applicable in our proposed 3D vertical RRAM structure were fabricated in order to reveal the effects of switching layer thickness and compliant current on resistive switching parameters. Forming-less behavior can be easily achieved by controlling thickness of the Si3N4 layer. It is found that the high- and low-resistance state can be effectively modulated by the film thickness and compliance current, respectively. (C) 2015 Elsevier B.V. All rights reserved.
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