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Etching mechanism of Pb(Zr,Ti)O-3 thin films in Cl-2/Ar plasma

Efremov, AM; Kim, DP; Kim, KT; Kim, CI

ArticleIssue Date2004CitationPLASMA CHEMISTRY AND PLASMA PROCESSING, v.24, no.1, pp 13 - 28PublisherKLUWER ACADEMIC/PLENUM PUBL
O2/BCl3/Ar 플라즈마를 이용한 HfAlO3 박막의 식각특성 연구

하태경; 우종창; 김창일

ArticleIssue Date2010Citation전기전자재료학회논문지, v.23, no.12, pp 924 - 928Publisher한국전기전자재료학회
Surface Etching of TiO2 Thin Films Using High Density Cl-2/Ar Plasma

Woo, Jong-Chang; Joo, Young-Hee; Kim, Chang-Il

ArticleIssue Date2015CitationTRANSACTIONS ON ELECTRICAL AND ELECTRONIC MATERIALS, v.16, no.6, pp 346 - 350PublisherKOREAN INST ELECTRICAL & ELECTRONIC MATERIAL ENGINEERS
Structural and dielectric properties of barium strontium calcium titanate thick films modified with MnO2 for phased array antennas

Lee, Sung-Gap; Kim, Chang-Il; Kim, Jeong-Phill; Lee, Sang-Heon

ArticleIssue Date2004CitationMATERIALS LETTERS, v.58, no.1-2, pp 110 - 114PublisherELSEVIER SCIENCE BV
The dry etching of a sol-gel deposited ZnO thin film in a high density BCl3/Ar plasma

Woo, Jong-Chang; Um, Doo-Seong; Kim, Chang-Il

ArticleIssue Date2010CitationTHIN SOLID FILMS, v.518, no.10, pp 2905 - 2909PublisherELSEVIER SCIENCE SA
The Etching Properties of SBT Thin Films in BC3/Cl 2/Ar Plasma

Yeo, J.-W.; Kim, D.-P.; Kim, C.-I.

ArticleIssue Date2003CitationIEEE International Conference on Plasma Science, pp 402
Inductively Coupled Plasma Etching of (Pb,Sr)TiO3 Thin Film in a Cl2/Ar Plasma

Kim, G.H.; Kim, D.P.; Kim, K.T.; Kim, C.I.

ArticleIssue Date2003CitationIEEE International Conference on Plasma Science, pp 402
Roles of N-2 gas in etching of platinum by inductively coupled Ar/Cl-2/N-2 plasmas

Ryu, Jae Heung; Kim, Nam Hoon; Kim, Hyeon Soo; Yeom, Geun Young; Chang, Eui Goo; Kim, Chang Il

ArticleIssue Date2000CitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.18, no.4, pp 1377 - 1380PublisherAMER INST PHYSICS
Comparison of the Electrical Properties for Etched and As-Deposited BET Thin Films

Lim, K.-T.; Kim, K.-T.; Kim, D.-P.; Kim, C.-I.

ArticleIssue Date2003CitationIEEE International Conference on Plasma Science, pp 403
Characterization of ferroelectric Bi3.25La0.75Ti3O12 thin films prepared by metal organic decomposition method

Kim, KT; Kim, CI

ArticleIssue Date2005CitationTHIN SOLID FILMS, v.478, no.1-2, pp 6 - 12PublisherELSEVIER SCIENCE SA
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