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Browsing by Kang, Young-MinAuthor

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SCIESCOPUS

Acid diffusion length limitation for 45 nm node attenuated and chromeless phase shift mask Go to Link

Kang, Young-Min; Park, Seung-Wook; Oh, Hye-Keun

ArticleIssue Date2007CitationProceedings of SPIE - The International Society for Optical Engineering, v.6730, pp 1 - 9

SCIESCOPUS

Characteristics and prevention of pattern collapse in EUV lithography Go to Link

Chang, Wook; Kim, Eun-Jin; Kang, Young-Min; Park, Seung-Wook; Lim, Chang-Moon; Won, Ki-Tak; Kim, Jai-Soon; Oh, Hye-Keun

ArticleIssue Date2007CitationProceedings of SPIE - The International Society for Optical Engineering, v.6517, no.PART 2, pp 1 - 7

SCIESCOPUS

Critical dimension control for 32 nm node random contact hole array using resist reflow process Go to Link

Park, Joon-Min; Kang, Young-Min; Hong, Joo-Yoo; Oh, Hye-Keun

ArticleIssue Date2008CitationJapanese Journal of Applied Physics, v.47, no.2, pp 1158 - 1160PublisherIOP Publishing Ltd

SCIESCOPUS

Critical dimension control for 32 nm node random contact hole array with resist reflow process Go to Link

Park, Joon-Min; Kang, Young-Min; Park, Seung-Wook; Hong, Joo-Yoo; Oh, Hye-Keun

ArticleIssue Date2007CitationProceedings of SPIE - The International Society for Optical Engineering, v.6730, pp 1 - 11PublisherSPIE

SCIESCOPUS

Haze Defects due to Pellicle Adhesive Go to Link

Kang, Young-Min; Park, Seung-Wook; Oh, Hye-Keun

ArticleIssue Date2008CitationJapanese Journal of Applied Physics, v.47, no.11, pp 8510 - 8514PublisherIOP Publishing Ltd

SCIESCOPUSKCI

Influence of Defects on Top of the Absorber in Extreme Ultraviolet Lithography Go to Link

Kim, Eun-Jin; Kang, Young-Min; Oh, Hye-Keun; Park, In-Ho; Lee, Jung-Youl; Kim, Deog-Bae; Kim, Jae-Hyun

ArticleIssue Date2009CitationJournal of the Korean Physical Society, v.55, no.2, pp 463 - 466Publisher한국물리학회

SCOPUSKCI

Investigation of Resolution Enhancement by Using Interferometric Immersion Lithography with a Lloyd Mirror Go to Link

You, Jee-Hye; Park, Seung-Wook; Kang, Young-Min; Oh, Hye-Keun

ArticleIssue Date2009CitationJournal of the Korean Physical Society, v.54, no.6, pp 2265 - 2268Publisher한국물리학회

SCIESCOPUS

Optimum biasing for 45 nm node chromeless and attenuated phase shift mask Go to Link

Kang, Young-Min; Oh, Hye-Keun

ArticleIssue Date2008CitationProceedings of SPIE - The International Society for Optical Engineering, v.6924, pp 1 - 9PublisherSPIE

SCIESCOPUS

Optimum biasing for 45 nm node chromeless and attenuated phase shift mask Go to Link

Kang, Young-Min; An, Ilsin; Shin, Dong-Soo; Oh, Hye-Keun

ArticleIssue Date2008CitationJapanese Journal of Applied Physics, v.47, no.9, pp 7448 - 7452PublisherIOP Publishing Ltd

SCIESCOPUS

Optimum dose variation caused by post exposure bake temperature difference inside photoresist over different sublayers and thickness Go to Link

Kang, Young-Min; An, Ilsin; Kim, Do Wan; Oh, Hye-Keun

ArticleIssue Date2008CitationProceedings of SPIE - The International Society for Optical Engineering, v.6924, pp 1 - 11

SCIESCOPUS

Process latitude dependency on local photomask haze defect in 70-nm binary intensity mask Go to Link

Kang, Young-Min; Kim, Sung-Jin; Park, Jin-Back; Chang, Wook; Park, Seung-Wook; Kim, Jai-Soon; Cho, Han-Koo; Oh, Hye-Keun

ArticleIssue Date2007CitationProceedings of SPIE - The International Society for Optical Engineering, v.6607, no.PART 2, pp 1 - 9PublisherSPIE

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Browsing by Kang, Young-MinAuthor

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