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SCIESCOPUS
Atomic-layer deposition of TiO2 thin films with a thermally stable (CpMe5) Ti(OMe)(3) precursorGo to Link

Chung, Hong Keun; Won, Sung Ok; Park, Yongjoo; Kim, Jin-Sang; Park, Tae Joo; Kim, Seong Keun

ArticleIssue Date2021CitationApplied Surface Science, v.550, pp 1 - 6PublisherElsevier BV
SCISCIESCOPUS
Chemical structures and electrical properties of atomic layer deposited HfO2 thin films grown at an extremely low temperature (<= 100 degrees C) using O-3 as an oxygen sourceGo to Link

Kim, Jeong Hwan; Park, Tae Joo; Kim, Seong Keun; Cho, Deok-Yong; Jung, Hyung-Suk; Lee, Sang Young; Hwang, Cheol Seong

ArticleIssue Date2014CitationApplied Surface Science, v.292, pp 852 - 856PublisherElsevier BV
SCIESCOPUS
Controlled Engineering of Defects and Interfaces in Thermoelectric Materials With Atomic Layer DepositionGo to Linkopen access

Park, Gwang Min; Lee, Seunghyeok; Park, Tae Joo; Baek, Seung-Hyub; Kim, Jin-Sang; Kim, Seong Keun

ArticleIssue Date2024CitationAdvanced Materials Interfaces, v.12, no.3, pp 1 - 14PublisherJohn Wiley and Sons Inc
SCIESCOPUS
Enhancing the crystallinity and dielectric performance of ALD-grown SrTiO3 films by introducing a sub-nm-thick Pt layeropen access

Chung, Hong Keun; Jeon, Jihoon; Ye, Seungwan; Kim, Sung-Chul; Won, Sung Ok; Park, Tae Joo; Kim, Seong Keun

ArticleIssue Date2025CitationJournal of Materials Chemistry C, v.13, no.13, pp 6851 - 6858PublisherRoyal Society of Chemistry
SCIESCOPUS
Grain boundary engineering strategy for simultaneously reducing the electron concentration and lattice thermal conductivity in n-type Bi2Te2.7Se0.3-based thermoelectric materialsGo to Linkopen access

Lee, Seunghyeok; Jung, Sung-Jin; Park, Gwang Min; Hong, Junpyo; Lee, Albert S.; Baek, Seung-Hyub; Kim, Heesuk; Park, Tae Joo; Kim, Jin-Sang; Kim, Seong Keun

ArticleIssue Date2023CitationJournal of the European Ceramic Society, v.43, no.8, pp 3376 - 3382PublisherElsevier Ltd
SCISCIESCOPUS
High quality interfacial sulfur passivation via H2S pre-deposition annealing for an atomic-layer-deposited HfO2 film on a Ge substrateGo to Link

Seok, Tae Jun; Cho, Young Jin; Jin, Hyun Soo; Kim, Dae Hyun; Kim, Dae Woong; Lee, Sang-Moon; Park, Jong-Bong; Won, Jung-Yeon; Kim, Seong Keun; Hwang, Cheol Seong, et al.

ArticleIssue Date2015CitationJournal of Materials Chemistry C, v.4, no.4, pp 850 - 856PublisherRoyal Society of Chemistry
SCISCIESCOPUS
Improved interface properties of atomic-layer-deposited HfO2 film on InP using interface sulfur passivation with H2S pre-deposition annealingGo to Link

Jin, Hyun Soo; Cho, Young Jin; Seok, Tae Jun; Kim, Dae Hyun; Kim, Dae Woong; Lee, Sang-Moon; Park, Jong-Bong; Yun, Dong-Jin; Kim, Seong Keun; Hwang, Cheol Seong, et al.

ArticleIssue Date2015CitationApplied Surface Science, v.357, no.Part B, pp 2306 - 2312PublisherElsevier BV
SCIESCOPUS
Investigation of phases and chemical states of tin titanate films grown by atomic layer depositionGo to Link

Chung, Hong Keun; Pyeon, Jung Joon; Baek, In-Hwan; Lee, Ga-Yeon; Lee, Hansol; Won, Sung Ok; Han, Jeong Hwan; Chung, Taek-Mo; Park, Tae Joo; Kim, Seong Keun

ArticleIssue Date2020CitationJournal of Vacuum Science and Technology A, v.38, no.1, pp 1 - 6PublisherAmerican Institute of Physics
SCIESCOPUS
Low temperature crystallization of atomic-layer-deposited SrTiO3 films with an extremely low equivalent oxide thickness of sub-0.4 nmGo to Linkopen access

Chung, Hong Keun; Jeon, Jihoon; Kim, Han; Jang, Myoungsu; Kim, Sung-Chul; Won, Sung Ok; Baek, In-Hwan; Chung, Yoon Jang; Han, Jeong Hwan; Cho, Sung Haeng, et al.

ArticleIssue Date2024CitationApplied Surface Science, v.664, pp 1 - 7PublisherElsevier B.V.
SCIESCOPUS
Nucleation and Layer Closure Behavior of Iridium Films Grown Using Atomic Layer DepositionGo to Link

Chung, Hong Keun; Kim, Han; Jeon, Jihoon; Kim, Sung-Chul; Won, Sung Ok; Harada, Ryosuke; Tsugawa, Tomohiro; Chung, Yoon Jang; Baek, Seung-Hyub; Park, Tae Joo, et al.

ArticleIssue Date2023CitationThe Journal of Physical Chemistry Letters, v.14, no.28, pp 6489 - 6493PublisherAmerican Chemical Society
SCIESCOPUS
Oxidation of thermoelectric Bi2Te3-based alloys by atomic layer deposition of Ru metalGo to Link

Lee, Seunghyeok; Lee, Minji; Park, Gwang Min; Baek, Seung-Hyub; Kim, Heesuk; Kim, Jin-Sang; Park, Tae Joo; Kim, Seong Keun

ArticleIssue Date2022CitationMaterials Letters, v.320, pp 1 - 4PublisherElsevier BV
SCIESCOPUS
Selective Dissolution-Derived Nanoporous Design of Impurity-Free Bi2Te3 Alloys with High Thermoelectric PerformanceGo to Link

Lee, Seunghyeok; Jung, Sung-Jin; Park, Gwang Min; Na, Min Young; Kim, Kwang-Chon; Hong, Junpyo; Lee, Albert S. S.; Baek, Seung-Hyub; Kim, Heesuk; Park, Tae Joo, et al.

ArticleIssue Date2023CitationSmall, v.19, no.14, pp 1 - 10PublisherWiley - V C H Verlag GmbbH & Co.
SCISCIESCOPUS
SnO2 thin films grown by atomic layer deposition using a novel Sn precursorGo to Link

Choi, Min-Jung; Cho, Cheol Jin; Kim, Kwang-Chon; Pyeon, Jung Joon; Park, Hyung-Ho; Kim, Hyo-Suk; Han, Jeong Hwan; Kim, Chang Gyoun; Chung, Taek-Mo; Park, Tae Joo, et al.

ArticleIssue Date2014CitationApplied Surface Science, v.320, pp 188 - 194PublisherElsevier BV
SCIESCOPUS
Strategic Selection of the Oxygen Source for Low Temperature-Atomic Layer Deposition of Al2O3 Thin FilmGo to Link

Jin, Hyun Soo; Kim, Dae Hyun; Kim, Seong Keun; Wallace, Robert M.; Kim, Jiyoung; Park, Tae Joo

ArticleIssue Date2019CitationAdvanced Electronic Materials, v.5, no.3, pp 1 - 7PublisherWiley-VCH Verlag
SCIESCOPUS
Unlocking the Potential of Porous Bi2Te3-Based Thermoelectrics Using Precise Interface Engineering through Atomic Layer DepositionGo to Link

Lee, Seunghyeok; Park, Gwang Min; Kim, Younghoon; Lee, So-Hyeon; Jung, Sung-Jin; Hong, Junpyo; Kim, Sung-Chul; Won, Sung Ok; Lee, Albert S.; Chung, Yoon Jang, et al.

ArticleIssue Date2024CitationACS Applied Materials and Interfaces, v.16, no.14, pp 1 - 9PublisherAmerican Chemical Society
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