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Effect of colloidal silcia and copper ions on PVA brush contamination during post-Cu CMP cleaning
- Authors
- 박진구
- Issue Date
- 29-Sep-2022
- Place
- 온라인
- Conference Name
- 2022 International Conference on Planarization/CMP Technology
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Related Researcher
- Park, Jin Goo
- ERICA 첨단융합대학 (ERICA 신소재·반도체공학전공)