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Area-Selective Atomic Layer Deposition of Ru Thin Films Using Phosphonic Acid Self-Assembled Monolayers for Metal/Dielectric Selectivity
- Authors
- 김우희
- Issue Date
- 25-Jul-2023
- Conference Name
- The 23rd International Conference on Atomic Layer Deposition (ALD 2023)
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Related Researcher
- Kim, Woo Hee
- ERICA 첨단융합대학 (ERICA 신소재·반도체공학전공)