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Reliability of coplanar oxide TFTs: Analysis and improvement

Authors
Baeck, Ju heyuckOh, SaeroonterLee, DohyungPark, Taeuk parkBae, Jong ukPark, Kwon shikYoon, SooyongKang, Inbyeong
Issue Date
May-2017
Publisher
Blackwell Publishing Ltd
Keywords
A-IGZO; Coplanar; ERDA; Interface trap density (Dit); Oxide TFT; PBTS; Phto C-V method; RBS; Top-gate; XRR
Citation
Digest of Technical Papers - SID International Symposium, v.48, no.1, pp.294 - 296
Indexed
SCOPUS
Journal Title
Digest of Technical Papers - SID International Symposium
Volume
48
Number
1
Start Page
294
End Page
296
URI
https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/11626
DOI
10.1002/sdtp.11611
ISSN
0097-966X
Abstract
We confirm that, the PBTS instability, of coplanar, InGaZnO TFTs can be improved, through the minimization of Non-Bridging Oxygen Vole Centers (NBOHC) and, optimization of hydrogen passivation in the GI/ACT interface region. The quantitative analysis of hydrogen and, oxygen in each region are obtained from physical property measurements. Trap density in GI/ACT interface layer is obtained by photonic capacitance-voltage measurements which are correlated, with PBTS characteristics. A decrease of under, coordinated bonding states lessens electron trap density, which brings improvement, in PBTS from Vth = 2.61V to 0.21V by process optimization. © (2017) by SID-the Society for Information Display. All rights reserved.
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COLLEGE OF ENGINEERING SCIENCES > SCHOOL OF ELECTRICAL ENGINEERING > 1. Journal Articles

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