Antistiction layers for nano imprinting lithography

Abstract

The main technique of NIL is relatively simple when compared with the conventional photolithography method. To nanoimprint a surface, three components are required: molds with suitable feature size, materials to be printed, and equipment for printing with adequate control of temperature, pressure, etc. NIL has the advantage over conventional nanofabrication methods because it is simple, low-cost, and applicable to plastic substrates. © 2007 by Taylor & Francis Group, LLC.