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Fabrication of a Ferroelectric Amorphous Oxide Semiconductor FET with Low Temperature Hf-Based Ferroelectric for Emerging Memory Applications
- Authors
- 김영현
- Issue Date
- 25-Aug-2023
- Place
- BEXCO
- Conference Name
- IMID2023
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Related Researcher
- Kim, Young hyun
- ERICA 첨단융합대학 (ERICA 반도체·디스플레이공학전공)