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Insertion loss and polarization-dependent loss measurement improvement to enable parallel silicon photonics wafer-level testing

Authors
Kim, DaehongDe Coster, JeroenVan Campenhout, JorisBan, YoojinVelenis, DimitriosSar, HuseyinKobbi, HakimMagdziak, RafalKim, Younghyun
Issue Date
Mar-2025
Publisher
Elsevier Ltd
Keywords
IL; Parallel test; PDL; Si photonics; SOP; Wafer testing
Citation
Optics and Lasers in Engineering, v.186
Indexed
SCIE
SCOPUS
Journal Title
Optics and Lasers in Engineering
Volume
186
URI
https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/121416
DOI
10.1016/j.optlaseng.2024.108742
ISSN
0143-8166
1873-0302
Abstract
We propose a measurement system that enables the rapid measurement of insertion loss and polarization-dependent loss using a parallel test setup with a fiber array, and the calibration procedure to be used within this system. By applying rough scan methods, we have developed a calibration algorithm that efficiently finds the accurately optimized state of polarization in minimal time. Through conducting on-wafer spectral optical power measurements, we compared conventional applications and our proposed algorithms. The results demonstrate that our method enables the almost simultaneous measurement of the spectral responses of multiple optical components. Moreover, the method enables to measure these responses with a well-defined input state of polarization (SOP) applied to each path individually. This novel approach holds promise for enhancing accuracy and cost-effectiveness in insertion loss and polarization-dependent loss measurements. © 2024 Elsevier Ltd
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ERICA 첨단융합대학 (ERICA 반도체·디스플레이공학전공)
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