A Device-to-System Perspective Regarding Self-Heating Enhanced Hot Carrier Degradation in Modern Field-Effect Transistors: A Topical Review
- Authors
- 신상훈
- Issue Date
- Nov-2019
- Publisher
- IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
- Keywords
- FinFETs; hot carrier degradation (HCD); power electronics; self-heating effect; universal scaling
- Citation
- IEEE TRANSACTIONS ON ELECTRON DEVICES, v.66, no.11, pp 4556 - 4565
- Pages
- 10
- Indexed
- SCI
SCIE
SCOPUS
- Journal Title
- IEEE TRANSACTIONS ON ELECTRON DEVICES
- Volume
- 66
- Number
- 11
- Start Page
- 4556
- End Page
- 4565
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/125048
- DOI
- 10.1109/TED.2019.2941445
- ISSN
- 0018-9383
1557-9646
- Abstract
- As foreseen by Keyes in the late 1960s, the self-heating effect has emerged as an important concern for device performance, output power density, run-time variability, and reliability of modern field-effect transistors. The self-heating effect is aggravated as the device footprint scales down for higher level of integration (low-power devices) or as the devices are operated in ultrahigh voltage regimes (high-power devices). In this article, we focus on the implications of self-heating on hot carrier degradation (HCD) of modern transistors by integrating within a coherent theoretical framework a broad range of experimental data scattered in the literature. We explain why system integration exacerbates transistor self-heating, while high-frequency digital operation ameliorates it, suggesting an opportunity for co-optimization. We conclude this article by discussing the various material-device-system design strategies to reduce HCD and suggesting open problems for further research.
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Collections - COLLEGE OF ENGINEERING SCIENCES > SCHOOL OF ELECTRICAL ENGINEERING > 1. Journal Articles

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