Laser Writing Block Copolymer Self-Assembly on Graphene Light-Absorbing Layer
- Authors
- Jin, Hyeong Min; Lee, Seung Hyun; Kim, Ju Young; Son, Seung-Woo; Kim, Bong Hoon; Lee, Hwan Keon; Mun, Jeong Ho; Cha, Seung Keun; Kim, Jun Soo; Nealey, Paul F.; Lee, Keon Jae; Kim, Sang Ouk
- Issue Date
- Mar-2016
- Publisher
- AMER CHEMICAL SOC
- Keywords
- block copolymer; self-assembly; directed self-assembly; laser; graphene; photothermal effect
- Citation
- ACS NANO, v.10, no.3, pp 3435 - 3442
- Pages
- 8
- Indexed
- SCI
SCIE
SCOPUS
- Journal Title
- ACS NANO
- Volume
- 10
- Number
- 3
- Start Page
- 3435
- End Page
- 3442
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/14184
- DOI
- 10.1021/acsnano.5b07511
- ISSN
- 1936-0851
1936-086X
- Abstract
- Recent advance of high-power laser processing allows for rapid, continuous, area-selective material fabrication, typically represented by laser crystallization of silicon or oxides for display applications. Two-dimensional materials such as graphene exhibit remarkable physical properties and are under intensive development for the manufacture of flexible devices. Here we demonstrate an area-selective ultrafast nanofabrication method using low intensity infrared or visible laser irradiation to direct the self-assembly of block copolymer films into highly ordered manufacturing-relevant architectures at the scale below 12 nm. The fundamental principles underlying this light-induced nanofabrication mechanism include the self-assembly of block copolymers to proceed across the disorder order transition under large thermal gradients, and the use of chemically modified graphene films as a flexible and conformal light-absorbing layers for transparent, nonplanar, and mechanically flexible surfaces.
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