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Optimization of meshed pellicle parameters for 16 nm node EUVL patterning
- Authors
- 오혜근
- Issue Date
- 27-Oct-2014
- Publisher
- Sematech
- Citation
- International Symposium on Extreme Ultraviolet lithography
- Conference Name
- International Symposium on Extreme Ultraviolet lithography
- Place
- Washington D.C.
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