이류체 노즐을 이용한 FPD 세정시스템 및 공정 개발

Abstract

As the fabrication technology used in FPDs(flat-panel displays) advances, the size of these panels is increasing andthe pattern size is decreasing to the um range. Accordingly, a cleaning process during the FPD fabrication process is becomingmore important to prevent yield reductions. The purpose of this study is to develop a FPD cleaning system and a cleaningprocess using a two-phase flow. The FPD cleaning system consists of two parts, one being a cleaning part which includes atwo-phase flow nozzle, and the other being a drying part which includes an air-knife and a halogen lamp. To evaluate theparticle removal efficiency by means of two-phase flow cleaning, silica particles 1.5 μm in size were contaminated onto a sixinchsilicon wafer and a four-inch glass wafer. We conducted cleaning processes under various conditions, i.e., DI water andnitrogen gas at different pressures, using a two-phase-flow nozzle with a gap distance between the nozzle and the substrate. The drying efficiency was also tested using the air-knife with a change in the gap distance between the air-knife and thesubstrate to remove the DI water which remained on the substrate after the two-phase-flow cleaning process. We obtained highefficiency in terms of particle removal as well as good drying efficiency through the optimized conditions of the two-phaseflowcleaning and air-knife processes.