Electrochemical migration of Ag nanoink patterns controlled by atmospheric-pressure plasma
- Authors
- Kim, Kwang-Seok; Kwon, Young-Tae; Choa, Yong-Ho; Jung, Seung-Boo
- Issue Date
- Jun-2013
- Publisher
- Elsevier BV
- Keywords
- Electrochemical migration (ECM); Dendritic growth; Atmospheric-pressure plasma; Silver nanoink; Inkjet printing
- Citation
- Microelectronic Engineering, v.106, pp.27 - 32
- Indexed
- SCIE
SCOPUS
- Journal Title
- Microelectronic Engineering
- Volume
- 106
- Start Page
- 27
- End Page
- 32
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/27941
- DOI
- 10.1016/j.mee.2013.01.041
- ISSN
- 0167-9317
- Abstract
- Highly contrasting surface energies were induced on polyimide (PI) substrates using atmospheric-pressure plasma (APP) to allow precise printing of Ag electrodes that showed mitigated electrochemical migration (ECM). The substrate surface was made uniformly hydrophobic via APP tetraethyl orthosilicate (TEOS) polymerization. Selected areas were then made hydrophilic via oxygen APP applied through a patterned metal mask. Ag nanoink was then inkjet-printed onto the hydrophilic portions and sintered for 30 min at various temperatures ranging from 100 to 250 degrees C. The resulting Ag patterned electrodes were of the desired dimensions and showed sharp edges. The Ag ECM dendrites deposited at the cathode took ca. 39% longer than in similar patterns printed on pristine substrates. The contrasting surface-energies induced by the plasma allowed precise control of the Ag electrodes' edges, which led to reduce ECM. (c) 2013 Elsevier B.V. All rights reserved.
- Files in This Item
-
Go to Link
- Appears in
Collections - COLLEGE OF ENGINEERING SCIENCES > DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING > 1. Journal Articles
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.