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Investigation for Resistive Switching by Controlling Overflow Current in Resistance Change Nonvolatile Memory

Authors
Ahn, Seung-EonLee, Myoung-JaeKang, Bo SooLee, DongsooKim, Chang-JungKim, Dong-SikChung, U-In
Issue Date
Nov-2012
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Keywords
Nickel oxide; nonvolatile memory; resistance switching
Citation
IEEE TRANSACTIONS ON NANOTECHNOLOGY, v.11, no.6, pp.1122 - 1125
Indexed
SCIE
SCOPUS
Journal Title
IEEE TRANSACTIONS ON NANOTECHNOLOGY
Volume
11
Number
6
Start Page
1122
End Page
1125
URI
https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/31439
DOI
10.1109/TNANO.2012.2214788
ISSN
1536-125X
Abstract
In recent years, resistance changes random access memory (RRAM) which shows reversible bistable resistance states by applied voltage has been studied as one of the alternatives of next-generation nonvolatile memory due to its excellent device characteristics including scalability, speed, and retention. Here, we report on the noncharge-based NiO RRAM device characteristics with load resistor as well as the simulation results of controlled conducting filament configuration. The RRAM device with load resistor showed super performances including highly reduction of switching current (similar to 1 order) and significantly improved switching voltage distribution (30% reduction).
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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY > DEPARTMENT OF APPLIED PHYSICS > 1. Journal Articles

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