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Imaging performance comparison between phase shift mask and binary intensity mask with 0.55 numerical aperture
오혜근
Conference
Issue Date
2020
Citation
SPIE 2020 Advanced Lithography
Publisher
SPIE
Place
San Jose, CA, USA
Pattern dependent mask distortion with extreme ultraviolet exposure
오혜근
Conference
Issue Date
2020
Citation
SPIE 2020 Advanced Lithography
Publisher
SPIE
Place
San Jose, CA, USA
Predicting lifetime of pellicle through heat and mechanical distortion caused by particle defect on extreme ultraviolet pellicle
오혜근
Conference
Issue Date
2020
Citation
SPIE 2020 Advanced Lithography
Publisher
SPIE
Place
San Jose, CA, USA
1
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OH, HYE KEUN
3
Date Issued
2020
3
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Conference
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