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2. Conference Papers(COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY > DEPARTMENT OF APPLIED PHYSICS > 2. Conference Papers)833

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Collection's Items (Sorted by Issue Date in Descending order): 421 to 440 of 833

Noise Characteristics in Multiple Quantum Well

정희준

ConferenceIssue Date2008Place광주, 한국
EUV Multilayer 표면 거칠기에 따른 패터닝 영향

오혜근

ConferenceIssue Date2008Citation2008년 가을 학술논문발표회 및 임시총회Publisher한국물리학회Place김대중컨벤션센터
High NA Immersion 에서 Resist Reflow Process 와 Hardmask 를 이용한 22 nm 1:1 Line and Space 제작을 위한 Double Patterning

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ConferenceIssue Date2008Citation2008년 가을 학술논문발표회 및 임시총회Publisher한국물리학회Place김대중컨벤션센터
32 nm half pitch formation with high NA single exposure

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ConferenceIssue Date2008Citation2008년 가을 학술논문발표회 및 임시총회Publisher한국물리학회Place김대중컨벤션센터
핫 플레이트(Hot Plate) 열 분포에 의한 웨이퍼 내부의 온도 변화

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ConferenceIssue Date2008Citation2008년 가을 학술논문발표회 및 임시총회Publisher한국물리학회Place김대중컨벤션센터
EUV Lithography 에서 Resist 재흐름 공정을 통한 패턴 거칠기의 축소

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ConferenceIssue Date2008Citation2008년 가을 학술논문발표회 및 임시총회Publisher한국물리학회Place김대중컨벤션센터
극자외선 Lithography 를 위한 Photoresist 의 구성 성분 특성과 표면 거칠기와의 관계

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ConferenceIssue Date2008Citation2008년 가을 학술논문발표회 및 임시총회Publisher한국물리학회Place김대중컨벤션센터
Position Shift Analysis in Resist Reflow Process for Sub-50 nm Contact Hole

오혜근

ConferenceIssue Date2008Citation2008년 가을 학술논문발표회 및 임시총회Publisher한국물리학회Place김대중컨벤션센터
Shot Noise Properties in a GaAs Small Quantum Dot

정희준

ConferenceIssue Date2008Place광주, 한국
Position Shift Analysis in Resist Reflow Process for Sub-50nm Contact Hole

정희준

ConferenceIssue Date2008Place광주, 한국
Fabrication and Characterization of the Ultrasmall Split Gate Type of GaAs Quantum Dots

정희준

ConferenceIssue Date2008Place광주, 한국
22 nm Node Process Latitude Variation due to Imperfect Reflection form EUV Mask Multilayer

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ConferenceIssue Date2008Citation2008 International Symposium on Extreme Ultraviolet LithographyPublisherSEMATECHPlaceCalifornia, Lake Tahoe
The Dependence of MEEF on the Mask Shadowing Effect

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ConferenceIssue Date2008Citation2008 International Symposium on Extreme Ultraviolet LithographyPublisherSEMATECHPlaceCalifornia, Lake Tahoe
Optical and Structural Properties of Nickel Oxide Films Investugated by Ellipsometry

정희준

ConferenceIssue Date2008Place제주, 한국
A study of attenuated PSM structure for EUVL to minimize mask shadowing effect

오혜근

ConferenceIssue Date2008Citation2008 International Workshop on EUV LithographyPublisherSPIEPlaceMaui, Hawaii
Ellipsometric inspection of the inner surface of pellicle-covered masks

오혜근

ConferenceIssue Date2008CitationSPIE Advanced LithographyPublisherSPIEPlaceSan Jose, CA, USA
Shot Noise Characteristics of Resonant-Tunneling Diode

정희준

ConferenceIssue Date2008Place대전
Random array contact hole position shift during resist reflow process

오혜근

ConferenceIssue Date2008Citation2008 년 봄 물리학회Publisher한국물리학회Place대전
22 nm 패턴 형성을 위한 EUV 입사각에 대한 연구

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ConferenceIssue Date2008Citation2008 년 봄 물리학회Publisher한국물리학회Place대전
Haze defects by pellicle adhesive

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ConferenceIssue Date2008Citation2008 년 봄 물리학회Publisher한국물리학회Place대전
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