ScholarWorks@Hanyang University ERICA Campus: 2. Conference Papers

2. Conference Papers(COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY > DEPARTMENT OF APPLIED PHYSICS > 2. Conference Papers)833

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Collection's Items (Sorted by Issue Date in Descending order): 501 to 520 of 833

Process optimization of 65 nm contact hole in the EUV lithography

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ConferenceIssue Date2006Citation2006 년 봄 한국물리학회 학술논문발표회Publisher한국물리학회Place휘닉스파크

극자외선(13.5 nm) 노광 마스크의 흡수체 n, k 값의 변화에 따른 반사도의 차이

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ConferenceIssue Date2006Citation2006 년 봄 한국물리학회 학술논문발표회Publisher한국물리학회Place휘닉스파크

Modeling for resist reflow of contact hole array

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ConferenceIssue Date2006Citation2006 년 봄 한국물리학회 학술논문발표회Publisher한국물리학회Place휘닉스파크

Preliminary simulation for laser mask pattern generator

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ConferenceIssue Date2006Citation2006 년 봄 한국물리학회 학술논문발표회Publisher한국물리학회Place휘닉스파크

Binary mask 에서의 local haze defect 의 투과율 변화에 따른 선폭과 공정 여유도 변화

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ConferenceIssue Date2006Citation2006 년 봄 한국물리학회 학술논문발표회Publisher한국물리학회Place휘닉스파크

Physical properties of ZnO nanowires with different growth directions

ConferenceIssue Date2006Place대한민국 강원도 평창

Acid Diffusion Length Corresponding to Post Exposure Bake Time and Temperature

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ConferenceIssue Date2006

Optimization of Chromeless Phase Mask by Comparing Scattering Bars with Zebra Patterns

ConferenceIssue Date2006PlaceSan Jose, California USA

Transport Properties of Coupled Quantum Double Quantum Dots

ConferenceIssue Date2005Place대한민국 광주과학기술원

Mask modification for the shadow effect reduction by rigorous coupled-wave analysis in extreme ultraviolet lithography

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ConferenceIssue Date2005CitationFourth International Extreme Ultra Violet Lithography (EUVL) SymposiumPublisherSEMATECHPlace미국 샌디에고

Reticle haze measurement by spectroscopic ellipsometry

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ConferenceIssue Date2005CitationMicro and Nano Conference 2005Publisher일본 응용물리학회Place동경

Aerial Image characteristics of modified absorber model for extreme ultraviolet lithography (EUVL)

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ConferenceIssue Date2005CitationMicro and Nano Conference 2005Publisher일본 응용물리학회Place동경

Hawking radiation as tunneling of massive sphereical shells

ConferenceIssue Date2005Place전북대학교

Mask Haze Inspection Method System by Ellipsometry

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ConferenceIssue Date2005Citation한국 물리학회 2005 년 가을학술논문발표회Publisher한국물리학회Place전북대

Imaging variation and reflectivity control using the ARC with polarized illumination, PSM, OAI for immersion lithography

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ConferenceIssue Date2005Citation한국 물리학회 2005 년 가을학술논문발표회Publisher한국물리학회Place전북대

Alternating phase shift mask phase uniformity according to duty ratio

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ConferenceIssue Date2005Citation한국 물리학회 2005 년 가을학술논문발표회Publisher한국물리학회Place전북대

Single trench AAPSM에서 pattern size 와 shape 에 따른 optimum biasing

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ConferenceIssue Date2005Citation한국 물리학회 2005 년 가을학술논문발표회Publisher한국물리학회Place전북대

Side wall effect of extreme ultraviolet lithography mask

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ConferenceIssue Date2005Citation한국 물리학회 2005 년 가을학술논문발표회Publisher한국물리학회Place전북대

산확산 거리의 물리적 분석과 시뮬레이션을 통한 비교 연구

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ConferenceIssue Date2005Citation한국 물리학회 2005 년 가을학술논문발표회Publisher한국물리학회Place전북대

Mask haze 로 인한 투과율 변화

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ConferenceIssue Date2005Citation한국 물리학회 2005 년 가을학술논문발표회Publisher한국물리학회Place전북대

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