Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Inhibition of Slurry Particles Contamination During CMP using Orgainc acid
- Authors
- 박진구
- Issue Date
- 19-May-2000
- Place
- 전남대학교
- Conference Name
- 한국재료학회 춘계 학술대회
- Files in This Item
- There are no files associated with this item.
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Park, Jin Goo
- ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)