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미세금형 가공을 위한 전기화학식각 공정의 유한요소 해석 및 실험결과 비교Finite Element Simulation and Experimental Study on the Electrochemical Etching Process for Fabrication of Micro Metal Mold

Other Titles
Finite Element Simulation and Experimental Study on the Electrochemical Etching Process for Fabrication of Micro Metal Mold
Authors
류헌열임현승조시형황병준이성호박진구
Issue Date
Sep-2012
Publisher
한국재료학회
Keywords
finite element simulation; electrochemical etching; TMEMM; metal mold
Citation
Korean Journal of Materials Research, v.22, no.9, pp 482 - 488
Pages
7
Indexed
SCOPUS
KCI
Journal Title
Korean Journal of Materials Research
Volume
22
Number
9
Start Page
482
End Page
488
URI
https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/35001
DOI
10.3740/MRSK.2012.22.9.482
ISSN
1225-0562
2287-7258
Abstract
To fabricate a precise micro metal mold, the electrochemical etching process has been researched. We investigated the electrochemical etching process numerically and experimentally to determine the etching tendency of the process, focusing on the current density, which is a major parameter of the process. The finite element method, a kind of numerical analysis,was used to determine the current density distribution on the workpiece. Stainless steel(SS304) substrate with various sized square and circular array patterns as an anode and copper(Cu) plate as a cathode were used for the electrochemical experiments. A mixture of H2SO4, H3PO4, and DIW was used as an electrolyte. In this paper, comparison of the results from the experiment and the numerical simulation is presented, including the current density distribution and line profile from the simulation, and the etching profile and surface morphology from the experiment. Etching profile and surface morphology were characterized using a 3D-profiler and FE-SEM measurement. From a comparison of the data, it was confirmed that the current density distribution and the line profile of the simulation were similar to the surface morphology and the etching profile of the experiment, respectively. The current density is more concentrated at the vertex of the square pattern and circumference of the circular pattern. And, the depth of the etched area is proportional to the current density.
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COLLEGE OF ENGINEERING SCIENCES > DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING > 1. Journal Articles

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ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)
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