Experimental Characterization and Signal Integrity Verification of Interconnect Lines with Inter-layer Vias
- Authors
- Kim, Hyewon; Kim, Dongchul; Eo, Yungseon
- Issue Date
- Mar-2011
- Publisher
- IEEK PUBLICATION CENTER
- Keywords
- Circuit model; eye-diagram; scattering parameter; via
- Citation
- JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE, v.11, no.1, pp 15 - 22
- Pages
- 8
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE
- Volume
- 11
- Number
- 1
- Start Page
- 15
- End Page
- 22
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/38230
- DOI
- 10.5573/JSTS.2011.11.1.015
- ISSN
- 1598-1657
2233-4866
- Abstract
- Interconnect lines with inter-layer vias are experimentally characterized by using high-frequency S-parameter measurements. Test patterns are designed and fabricated using a package process. Then they are measured using Vector Network Analyzer (VNA) up to 25 GHz. Modeling a via as a circuit, its model parameters are determined. It is shown that the circuit model has excellent agreement with the measured S-parameters. The signal integrity of the lines with inter-layer vias is evaluated by using the developed circuit model. Thereby, it is shown that via may have a substantially deteriorative effect on the signal integrity of high-speed integrated circuits.
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Collections - COLLEGE OF ENGINEERING SCIENCES > SCHOOL OF ELECTRICAL ENGINEERING > 1. Journal Articles

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