Optimization of DIO 3with megasonic cleaning of Ru capped EUVL mask for effective carbon contaminant removal
- Authors
- Lee, Seung Ho; Kang, Bong Kyun; Kim, Min su; Lim, Jungsoo; Jeong, Ji hyun; Park, Jin-Goo
- Issue Date
- Dec-2010
- Publisher
- Electrochemical Society, Inc.
- Citation
- ECS Transactions, v.41, no.5, pp 131 - 138
- Pages
- 8
- Indexed
- SCIE
SCOPUS
- Journal Title
- ECS Transactions
- Volume
- 41
- Number
- 5
- Start Page
- 131
- End Page
- 138
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/39173
- DOI
- 10.1149/1.3630836
- ISSN
- 1938-5862
1938-6737
- Abstract
- A possible candidate for carbon contaminant removal in Ru capped EUVL mask is ozone dissolved water (DIO 3). However, the use of DIO 3 leaves reflectivity loss and serious surface damages on Ru capping layer caused by its high oxidation potential. In this study, an optimum DIO 3 cleaning condition for effective carbon cleaning without surface damage was investigated both theoretically and experimentally. The effect of additive gases such as O 2, CO 2 and N 2 of various concentrations were tried during DIO 3 generation for oxidation stability on Ru capping layer and N 2 added 15 ppm DIO 3 was found to be the best condition. However carbon contaminant was ineffectively removed at this condition. Thus megasonic is irradiated during DIO 3 process and the results show that carbon is not only completely removed in a shorter time but also lower reflectivity loss was accomplished with minimal increase in the surface roughness. ©The Electrochemical Society.
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