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I-V characteristics of a vertical single Ni nanowire by voltage-applied atomic force microscopy
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Choi, D. S. | - |
| dc.contributor.author | Rheem, Y. | - |
| dc.contributor.author | Yoo, B. | - |
| dc.contributor.author | Myung, N. V. | - |
| dc.contributor.author | Kim, Y. K. | - |
| dc.date.accessioned | 2021-06-23T13:03:33Z | - |
| dc.date.available | 2021-06-23T13:03:33Z | - |
| dc.date.issued | 2010-07 | - |
| dc.identifier.issn | 1567-1739 | - |
| dc.identifier.issn | 1878-1675 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/39670 | - |
| dc.description.abstract | We report the measurement of the electrical resistivity of a vertical single Ni nanowire. A vertical array of Ni nanowires was fabricated on a Si substrate by electrodeposition using a nanoporous alumina template. The Ni nanowires possessed a face-centered-cubic polycrystalline structure. A voltage-applied atomic force microscope was used to make a nanometer-scale point contact on top of the vertical grown single Ni nanowire. The measured resistance was 1.1 M Omega for a nanowire with length of 3 mu m and diameter of 20 nm. (C) 2009 Elsevier B.V. All rights reserved. | - |
| dc.format.extent | 4 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Elsevier | - |
| dc.title | I-V characteristics of a vertical single Ni nanowire by voltage-applied atomic force microscopy | - |
| dc.type | Article | - |
| dc.publisher.location | 네델란드 | - |
| dc.identifier.doi | 10.1016/j.cap.2009.12.036 | - |
| dc.identifier.scopusid | 2-s2.0-77951229845 | - |
| dc.identifier.wosid | 000277837500009 | - |
| dc.identifier.bibliographicCitation | Current Applied Physics, v.10, no.4, pp 1037 - 1040 | - |
| dc.citation.title | Current Applied Physics | - |
| dc.citation.volume | 10 | - |
| dc.citation.number | 4 | - |
| dc.citation.startPage | 1037 | - |
| dc.citation.endPage | 1040 | - |
| dc.type.docType | Article | - |
| dc.identifier.kciid | ART001467934 | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | sci | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.description.journalRegisteredClass | kci | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.subject.keywordPlus | MAGNETIZATION REVERSAL | - |
| dc.subject.keywordPlus | MAGNETORESISTANCE | - |
| dc.subject.keywordAuthor | Single Ni nanowire | - |
| dc.subject.keywordAuthor | Voltage-applied atomic force microscopy | - |
| dc.subject.keywordAuthor | Electrical resistance | - |
| dc.identifier.url | https://www.sciencedirect.com/science/article/pii/S1567173909006233?via%3Dihub | - |
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