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Effect of polish by-products on chemical mechanical planarization defects
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 박진구 | - |
| dc.date.accessioned | 2021-06-23T14:40:38Z | - |
| dc.date.available | 2021-06-23T14:40:38Z | - |
| dc.date.created | 2021-02-18 | - |
| dc.date.issued | 2009-11-19 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/40651 | - |
| dc.publisher | Japan planarization and CMP technical committee | - |
| dc.title | Effect of polish by-products on chemical mechanical planarization defects | - |
| dc.type | Article | - |
| dc.contributor.affiliatedAuthor | 박진구 | - |
| dc.identifier.bibliographicCitation | 2009 ICPT | - |
| dc.relation.isPartOf | 2009 ICPT | - |
| dc.citation.title | 2009 ICPT | - |
| dc.type.rims | ART | - |
| dc.description.journalClass | 3 | - |
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Related Researcher
- Park, Jin Goo
- ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)