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Passivation Control of Co Surface for CMP and Post-CMP Cleaning
- Authors
- 박진구
- Issue Date
- 17-Sep-2019
- Place
- Ambassador Hotel, Hsinchu, Taiwan
- Conference Name
- 2019 International Conference on Planarization/CMP Technology
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Related Researcher
- Park, Jin Goo
- ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)