CNT 성장시 Ni 및 Co 촉매의 조성비에 따른 CNT-W팁의 전계 방출 특성 분석

Abstract

Carbon nanotubes (CNTs) are directly grown on W-tips at 700℃ using an ICP-CVD method. Sharpening of W-tip is done by electrochemical etch and their diameters are limited to range from 3㎛ to 5㎛. Catalysts for CNTs growth are formed by RF and DC co-sputtering systems using Ni and Co. The composition ratio of Ni and Co has been evaluated by energy dispersive x-ray spectroscopy (EDS). The micro-images of CNTs are monitored by field emission scanning electron microscope (FESEM). It is observed from Raman study that the intensity of the D-peak is increased by increasing the amount of Co catalyst. Furthermore, the measurement of field emission properties of CNTs show that the CNT grown on a single Co catalyst possess the greatest performance such as Vth=1,115V and Imax=164㎂.