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Post-CMP Cleaning
- Authors
- Park, Jin-Goo; Busnaina, Ahmed A.; Hong, Yi-Koan
- Issue Date
- Mar-2007
- Publisher
- John Wiley & Sons, Inc.
- Keywords
- Double-sided scrubber and spin-rinse dryer; Hydrodynamic boundary layer; Single-wafer megasonic cleaner
- Citation
- Microelectronic Applications of Chemical Mechanical Planarization, pp.467 - 509
- Indexed
- SCOPUS
- Journal Title
- Microelectronic Applications of Chemical Mechanical Planarization
- Start Page
- 467
- End Page
- 509
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Related Researcher
- Park, Jin Goo
- ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)