In situ Particle Monitoring(ISPM) System Development with Ion Counting Method and its Performance Evaluation in Vacuum Environment

안강호

Detailed Information

Cited 0 time in webofscience

Cited 0 time in scopus

Metadata Downloads

In situ Particle Monitoring(ISPM) System Development with Ion Counting Method and its Performance Evaluation in Vacuum Environment

Authors: 안강호

Issue Date: 15-Nov-2006

Publisher: CUP

Citation: 7th Japan-Korea Joint Workshop on Advanced Semiconductor Processes and Equipments

Journal Title: 7th Japan-Korea Joint Workshop on Advanced Semiconductor Processes and Equipments

URI: https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/44481

Files in This Item: There are no files associated with this item.

Appears in Collections: COLLEGE OF ENGINEERING SCIENCES > DEPARTMENT OF MECHANICAL ENGINEERING > 1. Journal Articles

Show full item record

qrcode

Altmetrics

Total Views & Downloads

STATISTICS: Total View :2,609,309; Today View :6,530

RSS_1.0 RSS_2.0 ATOM_1.0

55 Hanyangdeahak-ro, Sangnok-gu, Ansan, Gyeonggi-do, 15588, Korea+82-31-400-4269 sweetbrain@hanyang.ac.kr

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.

Detailed Information

Altmetrics

Total Views & Downloads

BROWSE