Fabrication of nano- and micro-scale UV imprint stamp using diamond-like carbon coating technology
- Authors
- Lee, Eung-Sug; Jeong, Jun-Ho; Kim, Ki-Don; Sim, Young-Suk; Choi, Dae-Geun; Choi, Junhyuk; Park, Sang-Hu; Lim, Tae-Woo; Yang, Dong-Yol; Cha, Nam-Goo; Park, Jin-Goo; Lee, Wi-Ro
- Issue Date
- Nov-2006
- Publisher
- American Scientific Publishers
- Keywords
- UV-imprint lithography; diamond-like carbon; stamp; focused ion beam
- Citation
- Journal of Nanoscience and Nanotechnology, v.6, no.11, pp.3619 - 3623
- Indexed
- SCIE
SCOPUS
- Journal Title
- Journal of Nanoscience and Nanotechnology
- Volume
- 6
- Number
- 11
- Start Page
- 3619
- End Page
- 3623
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/44557
- DOI
- 10.1166/jnn.2006.068
- ISSN
- 1533-4880
- Abstract
- Two-dimensional (2-D) and three-dimensional (3-D) diamond-like carbon (DLC) stamps for ultraviolet nanoimprint lithography were fabricated with two methods: namely, a DLC coating process, followed by focused ion beam lithography; and two-photon polymerization patterning, followed by nanoscale-thick DLC coating. We used focused ion beam lithography to fabricate 70 nm deep lines with a width of 100 nm, as well as 70 nm deep lines with a width of 150 nm, on 100 nm thick DLC layers coated on quartz substrates. We also used two-photon polymerization patterning and a DLC coating process to successfully fabricate 200 nm wide lines, as well as 3-D rings with a diameter of 1.35 mu m and a height of 1.97 mu m, and a 3-D cone with a bottom diameter of 2.88 mu m and a height of 1.97 mu m. The wafers were successfully printed on an UV-NIL using the DLC stamps without an anti-adhesive layer. The correlation between the dimensions of the stamp's features and the corresponding imprinted features was excellent.
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Collections - COLLEGE OF ENGINEERING SCIENCES > DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING > 1. Journal Articles
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