Development of in-situ SUB-100nm particle detection in vacuum system
- Authors
- Ahn, Kang-Ho; Kim, Yong-min
- Issue Date
- Oct-2006
- Publisher
- Trans Tech Publications Ltd.
- Keywords
- particle charging in vacuum; vacuum particle; semiconductor processing equipment; monodisperse particle; corona charging; Faraday cup
- Citation
- Key Engineering Materials, v.321-323, pp 1707 - 1710
- Pages
- 4
- Indexed
- SCIE
SCOPUS
- Journal Title
- Key Engineering Materials
- Volume
- 321-323
- Start Page
- 1707
- End Page
- 1710
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/45375
- DOI
- 10.4028/www.scientific.net/KEM.321-323.1707
- ISSN
- 1013-9826
1662-9795
- Abstract
- A feasibility test for real-time fine particle measurements in vacuum semiconductor processing equipment has been conducted. The approach in monitoring particles in process equipment is an installation of a sensor at a critical location inside the process equipment (hence the term 'in-situ') to track free particle levels in real-time. Common method for particle detection in a process chamber today is a use of test wafer with a laser wafer scanner. However, this method does not give a real time information of the particle status in the process chamber. In this paper, a new method has been developed to detect particles in real time in vacuum system for particles smaller than an optical method can detect. The system consists of a particle charging region and a particle detection region in a vacuum system. Particles with 50nm are successfully detected at about 10 torr region.
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Collections - COLLEGE OF ENGINEERING SCIENCES > DEPARTMENT OF MECHANICAL ENGINEERING > 1. Journal Articles
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