Optimizing ArF photoresist parameter to reduce mask error factor (MEF)

오혜근

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Optimizing ArF photoresist parameter to reduce mask error factor (MEF)

Authors: 오혜근

Issue Date: 13-Apr-2005

Publisher: SPIE

Citation: Photomask Japan 2005

Journal Title: Photomask Japan 2005

URI: https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/46007

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Appears in Collections: COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY > DEPARTMENT OF APPLIED PHYSICS > 1. Journal Articles

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