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Mechanism of low temperature hydrogen-annealing-induced degradation in Pb(Zr0.4Ti0.6)O-3 capacitors

Authors
Seo, SYoon, JGSong, TKKang, BSNoh, TWLee, YKKim, CJPark, YS
Issue Date
Jul-2002
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v.81, no.4, pp.697 - 699
Indexed
SCIE
SCOPUS
Journal Title
APPLIED PHYSICS LETTERS
Volume
81
Number
4
Start Page
697
End Page
699
URI
https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/46801
DOI
10.1063/1.1492006
ISSN
0003-6951
Abstract
Changes in the polarization-field hysteresis loop were systematically investigated for Pb(Zr0.4Ti0.6)O-3 capacitors after forming gas annealing at 200 degreesC. Voltage shift in hysteresis was strongly dependent on the polarization states and ascribed to an asymmetric distribution of defect charges and pinned defect dipoles. Field recovery of the imprinted capacitors and increase in coercive field after the recovery were discussed in conjunction with reversible defect dipoles. From the relaxation of the voltage shift with an activation energy of 0.21 eV, it is inferred that charge trapping may be the main cause of the voltage shift and the subsequent degradation of the capacitors by pinning the polarization and defect dipoles. (C) 2002 American Institute of Physics.
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