Enhanced Light Stability of InGaZnO Thin-Film Transistors by Atomic-Layer-Deposited Y2O3 with Ozone
- Authors
- Jung, Hanearl; Kim, Woo-Hee; Park, Bo-Eun; Woo, Whan Je; Oh, Il-Kwon; Lee, Su Jeong; Kim, Yun Cheol; Myoung, Jae-Min; Gatineau, Satoko; Dussarrat, Christian; Kim, Hyungjun
- Issue Date
- Jan-2018
- Publisher
- American Chemical Society
- Keywords
- IGZO TFT; passivation; Y2O3; ozone; atomic layer deposition
- Citation
- ACS Applied Materials and Interfaces, v.10, no.2, pp.2143 - 2150
- Indexed
- SCIE
SCOPUS
- Journal Title
- ACS Applied Materials and Interfaces
- Volume
- 10
- Number
- 2
- Start Page
- 2143
- End Page
- 2150
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/6856
- DOI
- 10.1021/acsami.7b14260
- ISSN
- 1944-8244
- Abstract
- We report the effect of Y2O3 passivation by atomic layer deposition (ALD) using various oxidants, such as H2O, O-2 plasma, and O-3, on In-Ga-Zn-O thin-film transistors (IGZO TFTs). A large negative shift in the threshold voltage (V-th) was observed in the case of the TFT subjected to the H2O-ALD Y2O3 process; this shift was caused by a donor effect of negatively charged chemisorbed H2O molecules. In addition, degradation of the IGZO TFT device performance after the O-2 plasma-ALD Y2O3 process (field-effect mobility (mu) = 8.7 cm(2)/(V.s), subthreshold swing (SS) = 0.77 V/dec, and V-th = 3.7 V) was observed, which was attributed to plasma damage on the IGZO surface adversely affecting the stability of the TFT under light illumination. In contrast, the O-3-ALD Y2O3 process led to enhanced device stability under light illumination (Delta V-th = 1 V after 3 h of illumination) by passivating the subgap defect states in the IGZO surface region. In addition, TFTs with a thicker IGZO film (55 nm, which was the optimum thickness under the current investigation) showed more stable device performance than TFTs with a thinner IGZO film (30 nm) (Delta V-th = -0.4 V after 3 h of light illumination) by triggering the recombination of holes diffusing from the IGZO surface to the insulator-channel interface. Therefore, we envisioned that the O-3-ALD Y2O3 passivation layer suggested in this paper can improve the photostability of TFTs under light illumination.
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