A G-Band Frequency Doubler Using a Commercial 150 nm GaAs pHEMT Technology
- Authors
- Lee, Iljin; Kim, Junghyun; Jeon, Sanggeun
- Issue Date
- Jul-2017
- Publisher
- KOREAN INST ELECTROMAGNETIC ENGINEERING & SCIENCE
- Keywords
- Frequency Doubler; G-Band; GaAs pHEMT; Harmonic Matching
- Citation
- JOURNAL OF ELECTROMAGNETIC ENGINEERING AND SCIENCE, v.17, no.3, pp 147 - 152
- Pages
- 6
- Indexed
- SCOPUS
ESCI
KCI
- Journal Title
- JOURNAL OF ELECTROMAGNETIC ENGINEERING AND SCIENCE
- Volume
- 17
- Number
- 3
- Start Page
- 147
- End Page
- 152
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/9477
- DOI
- 10.5515/JKIEES.2017.17.3.147
- ISSN
- 2234-8409
2234-8395
- Abstract
- This paper presents a frequency doubler operating at G-band that exceeds the maximum oscillation frequency (f(max)) of the given transistor technology. A common-source transistor is biased on class-B to obtain sufficient output power at the second harmonic frequency. The input and output impedances are matched to achieve high output power and high return loss. The frequency doubler is fabricated in a commercial 150-nm GaAs pHEMT process and obtains a measured conversion gain of -5.5 dB and a saturated output power of -7.5 dBm at 184 GHz.
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