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SCIESCOPUS
Effects of IL-7 and dexamethasone: Induction of CD25, the high affinity IL-2 receptor, on human CD4(+) cellsGo to Link

Chung, Il Yup; Dong, Hui Fang; Zhang, Xia; Hassanein, Nahed M.A.; Howard, O.M. Zack; Oppenheim, Joost J.; Chen, Xin

ArticleIssue Date2004CitationCellular Immunology, v.232, no.1-2, pp.57 - 63PublisherAcademic Press
SCOPUS
Discrete-continuous configuration optimization methods for structures using the harmony search algorithm

Lee, K.S.; Choi, C.S.

ArticleIssue Date2006CitationKey Engineering Materials, v.324-325 II, pp.1293 - 1296PublisherTrans Tech Publications Ltd
SCIESCOPUS
PDMS-glass serpentine microchannel chip for time domain PCR with bubble suppression in sample injectionGo to Link

Cho, Chul-Ho; Cho, Woong; Ahn, Yoomin; Hwang, Seung-Yong

ArticleIssue Date2007CitationJournal of Micromechanics and Microengineering, v.17, no.9, pp.1810 - 1817PublisherInstitute of Physics Publishing
SCIESCOPUS
Bayesian single change point detection in a sequence of multivariate normal observationsGo to Link

Son, Young Sook; Kim, Seong Wook

ArticleIssue Date2005CitationStatistics, v.39, no.5, pp.373 - 387PublisherTaylor & Francis
SCOPUS
Temperature and critical dimension variation in a single wafer on hot plate due to non-uniform heat sourceGo to Link

Kim, B.; Park, J.-M.; Kim, H.; An, I.; Park, S.-W.; Oh, H.-K.

ArticleIssue Date2009CitationProceedings of SPIE - The International Society for Optical Engineering, v.7273
SCOPUS
Position shift analysis in resist reflow process for sub-50 nm contact holeGo to Link

You, J.-H.; Park, J.; Park, J.-M.; Jeong, H.; Oh, H.-K.

ArticleIssue Date2009CitationProceedings of SPIE - The International Society for Optical Engineering, v.7273
SCOPUS
Embedded micro / nano channels formation for three-dimensional negative-tone photoresist microstructuringGo to Link

Kim, S.-K.; Oh, H.-K.; Jung, Y.-D.; An, I.

ArticleIssue Date2009CitationProceedings of SPIE - The International Society for Optical Engineering, v.7273
SCOPUS
Photoresist adhesion effect of resist reflow processGo to Link

Park, J.-M.; Lee, J.-E.; Kim, M.-S.; Kim, J.-H.; Kim, J.-S.; Lee, S.-M.; Park, J.-T.; Bok, C.-K.; Moon, S.-C.; Park, S.-W., et al.

ArticleIssue Date2007CitationProceedings of SPIE - The International Society for Optical Engineering, v.6519, no.PART 2
SCIESCOPUS
Mode and design sensitivity analyses for brake judder reductionGo to Link

Hwang, I-J; Park, G. -J

ArticleIssue Date2008CitationPROCEEDINGS OF THE INSTITUTION OF MECHANICAL ENGINEERS PART D-JOURNAL OF AUTOMOBILE ENGINEERING, v.222, no.7, pp.1259 - 1272PublisherPROFESSIONAL ENGINEERING PUBLISHING LTD
SCOPUS
Characteristics and prevention of pattern collapse in EUV lithographyGo to Link

Chang, W.; Kim, E.-J.; Kang, Y.-M.; Park, S.-W.; Lim, C.-M.; Won, K.-T.; Kim, J.-S.; Oh, H.-K.

ArticleIssue Date2007CitationProceedings of SPIE - The International Society for Optical Engineering, v.6517, no.PART 2
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