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메쉬 구조의 Ag 나노박막을 이용한 ITO/Mesh-Ag/ITO 고전도성 투명전극 제조 및 특성 분석Fabrication of the ITO/Mesh-Ag/ITO Transparent Electrode using Ag Nano- Thin Layer with a Mesh Structure and Its Characterization

Other Titles
Fabrication of the ITO/Mesh-Ag/ITO Transparent Electrode using Ag Nano- Thin Layer with a Mesh Structure and Its Characterization
Authors
권상직이동현조의식
Issue Date
2019
Publisher
한국반도체디스플레이기술학회
Keywords
Transparent conductive oxide; ITO/Ag/ITO; In-line sputtering; ITO/Mesh-Ag/ITO multiple layers; Open ratio
Citation
반도체디스플레이기술학회지, v.18, no.4, pp.100 - 104
Journal Title
반도체디스플레이기술학회지
Volume
18
Number
4
Start Page
100
End Page
104
URI
https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/19339
ISSN
1738-2270
Abstract
The ‘ITO/Ag/ITO’ multilayers as a highly conductive and transparent electrode, even with the optimum thickness conditions, the transmittances were much lower than those of a single ITO layer on some ranges of the visible wavelength. In order to improve the transmittance, Ag layer was formed with mesh structure. Where, the thickness of the Ag layer was about 10 nm and the space between the Ag lines was varied from 2.9 m to 19.6 m with the fixed Ag width of about 1.2 m in order to vary an open ratio of the Ag mesh structure. The transmittance and sheet resistance in the ITO/Mesh-Ag/ITO multilayer structure were analyzed depending on the open ratio. As a result, a trade off in the open ratio was necessary in order to obtain the transmittance as high as possible and the sheet resistance as possible low. By the open ratio of about 86 %, in the ITO/Mesh-Ag/ITO multilayer structure, the transmittance was nearly same as the single ITO layer and the sheet resistance was about 62.3  
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반도체대학 (반도체·전자공학부)
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