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Direct growth of orthorhombic Hf0.5Zr0.5O2 thin films for hysteresis-free MoS2 negative capacitance field-effect transistors (vol 5, 58, 2021)
- Authors
- Cho, Hae Won; Pujar, Pavan; Choi, Minsu; Kang, Seunghun; Hong, Seongin; Park, Junwoo; Baek, Seungho; Kim, Yunseok; Lee, Jaichan; Kim, Sunkook
- Issue Date
- May-2021
- Publisher
- NATURE RESEARCH
- Citation
- NPJ 2D MATERIALS AND APPLICATIONS, v.5, no.1
- Journal Title
- NPJ 2D MATERIALS AND APPLICATIONS
- Volume
- 5
- Number
- 1
- ISSN
- 2397-7132
- Abstract
- The original version of this Article contained an error in the Acknowledgements: ‘2021R1A2B5B0200216’ should have read ‘2021R1A2B5B02002167’. This has now been corrected in both the PDF and HTML versions of the Article. © The Author(s) 2021.
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Related Researcher
- Hong, Seongin
- BioNano Technology (Department of Physics)