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Showing results 1 to 17 of 17

SCIESCOPUS
A harmonic method for measuring electron temperature and ion density using an asymmetric double probeGo to Link

Eo, Hyundong; Park, Sung Joon; Kim, Ju Ho; Chung, Chin-Wook

ArticleIssue Date2024CitationPlasma Sources Science and Technology, v.33, no.2, pp 1 - 10PublisherInstitute of Physics Publishing
SCIESCOPUS
A method for measuring individual ion density in an Ar/He mixture inductively coupled plasmaGo to Link

Son, Jin-Ung; Lee, Moo-Hyun; Kim, Min-Seok; Jung, Jiwon; Seo, Beom-Jun; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2025CitationPlasma Sources Science and Technology, v.34, no.3, pp 1 - 10PublisherInstitute of Physics Publishing
SCIESCOPUS
Control of photoresist etch rate via a gradient magnetic field in biased inductively coupled plasmaGo to Link

Jiang, Yi-Lang; Jeong, Yeong Jae; Kim, Jae-Hwi; Kim, Min-Seok; Lee, Myoung-Jae; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2025CitationPlasma Sources Science and Technology, v.34, no.7, pp 1 - 13PublisherInstitute of Physics Publishing
SCIESCOPUS
Control of the photoresist etch uniformity in inductive discharge with magnetic resonance wireless power transferGo to Link

Park, Junyoung; Hong, Young-Hun; Kang, Gil-Ho; Kim, Min-Seok; Seo, Beom-Jun; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2025CitationPlasma Sources Science and Technology, v.34, no.2, pp 1 - 13PublisherInstitute of Physics Publishing
SCIESCOPUS
Effect of a DC gradient magnetic field on electron density in a weakly magnetized inductively coupled plasmaGo to Link

He, You; Jiang, Yi-Lang; Lee, Myoung-Jae; Kim, Min-Seok; Seo, Beom-Jun; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2024CitationJournal of Vacuum Science and Technology A, v.42, no.6, pp 1 - 12PublisherAmerican Institute of Physics
Electrical Characteristics of Inductively Coupled Plasma Sources using Magnetic Resonance Wireless Power Transmission System

김주호

ConferenceIssue Date2020Place소노캄(제주)
Experimantal observation of hysteresis in a neon inductively coupled plasma at low pressure

김주호

ConferenceIssue Date2022PlaceBarcelona
Experimental investigation on capacitively coupled plasma source using a passive resonant antenna

김주호

ConferenceIssue Date2020
Experimental observation of plasma parameter and photoresist ashing in an inductively coupled plasma sources with MRWPT antenna

김주호

ConferenceIssue Date2022PlaceBarcelona
Hybrid plasma source with wireless power transmission system

김주호

ConferenceIssue Date2023PlaceLisbon
Inductively coupled plasma sources for photoresist ashing

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ConferenceIssue Date2021Place소노캄(제주)
SCIESCOPUS
Ion energy distribution measurement device using a capillary plate with high-aspect ratioGo to Link

Lee, Ho-Won; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2023CitationPhysics of Plasmas, v.30, no.12, pp 1 - 6PublisherAmerican Institute of Physics
On plasma parameters with changing chamber size

김주호

ConferenceIssue Date2022PlaceSendai International Center, Sendai, Japan
Photoresist ashing in inductively coupled plasma with magnetic resonance wireless power transfer system

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ConferenceIssue Date2021Placevirtual platform
SCIESCOPUS
The effect of two ECR zones on dual frequency inductively coupled plasma using a gradient DC magnetic fieldGo to Linkopen access

Jiang, Yi-Lang; He, You; Kim, Min-Seok; Lee, Myoung-Jae; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2025CitationJournal of Applied Physics, v.137, no.21, pp 1 - 10PublisherAmerican Institute of Physics
유도 결합 플라즈마에서 이온 밀도 및 균일도 제어

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ConferenceIssue Date2023Place제주대학교 아라컨벤션홀 대회의실
이중주파수 유도결합 플라즈마에서 모드전이 연구

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ConferenceIssue Date2021Place소노캄(제주)
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