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Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition, using O-2 plasma and N2O plasma Go to Link

Kim, Seokhoon; Kim, Jinwoo; Choi, Jihoon; Kang, Hyunseok; Jeon, Hyeongtag; Bae, Choelhwyi

ArticleIssue Date2006CitationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.24, no.3, pp 1088 - 1093PublisherAmerican Institute of Physics

SCIESCOPUS

Characteristics of remote plasma atomic layer-deposited HfO2 films on O-2 and N-2 plasma-pretreated Si substrates Go to Link

Choi, Jihoon; Kim, Seokhoon; Kim, Jinwoo; Kang, Hyunseok; Jeon, Hyeongtag; Bae, Choelhwyi

ArticleIssue Date2006CitationJournal of Vacuum Science and Technology A, v.24, no.3, pp 678 - 681PublisherAmerican Institute of Physics

SCIESCOPUS

Effect of nitrogen incorporation in HfO2 films deposited by plasma-enhanced atomic layer deposition Go to Link

Lee, Yujin; Kim, Seokhoon; Koo, Jaehyoung; Kim, Inhoe; Choi, Jihoon; Jeon, Hyeongtag; Won, Youngdo

ArticleIssue Date2006CitationJournal of the Electrochemical Society, v.153, no.4, pp G353 - G357PublisherElectrochemical Society, Inc.

SCIESCOPUS

Effects of N-2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods Go to Link

Choi, Jihoon; Kim, Seokhoon; Kim, Jinwoo; Kang, Hyunseok; Jeon, Hyeongtag; Bae, Choelhwyi

ArticleIssue Date2006CitationJournal of Vacuum Science and Technology A, v.24, no.4, pp 900 - 907PublisherAmerican Institute of Physics

SCIESCOPUS

Effects of N-2 RPN on the structural and electrical characteristics of remote plasma atomic layer-deposited HfO2 films Go to Link

Choi, Jihoon; Kim, Seokhoon; Kang, Hyunseok; Jeon, Hyeongtag; Bae, Choelhwyi

ArticleIssue Date2006CitationElectrochemical and Solid-State Letters, v.9, no.3, pp F13 - F15PublisherElectrochemical Society, Inc.

SCIESCOPUS

Effects of remote plasma pre-oxidation of Si substrates on the characteristics of ALD-deposited HfO2 gate dielectrics Go to Link

Kang, Hyunseok; Kim, Seokhoon; Choi, Jihoon; Kim, Jinwoo; Jeon, Hyeongtag; Bae, Choelhwyi

ArticleIssue Date2006CitationElectrochemical and Solid-State Letters, v.9, no.6, pp G211 - G214PublisherElectrochemical Society, Inc.

SCIESCOPUS

Fast first arrival picking algorithm for noisy microseismic data Go to Link

Kim, Dowan; Byun, Joong moo; Lee, Minho; Choi, Jihoon; Kim, Myungsun

ArticleIssue Date2017CitationExploration Geophysics, v.48, no.2, pp 131 - 136PublisherConsultants Bureau

SCIESCOPUS

Optimal transmission policies for MOT in T-DMB Go to Link

Lee, Donghwan; Choi, Jihoon; Kim, Kyunghwi; Lee, Wonjun; Lee, Choonhwa

ArticleIssue Date2007CitationIEEE Communications Letters, v.11, no.12, pp 1031 - 1033PublisherInstitute of Electrical and Electronics Engineers

SCIESCOPUS

Remote plasma atomic layer deposition of HfO2 thin films using the alkoxide precursor Hf(mp)(4)Go to Link

Kim, Seokhoon; Kim, Jinwoo; Choi, Jihoon; Kang, Hyunseok; Jeon, yeongtag; Cho, Wontae; An, Ki-Seok; Chung, Taek-Mo; Kim, Yunsoo; Bae, Choelhwyi

ArticleIssue Date2006CitationElectrochemical and Solid-State Letters, v.9, no.6, pp G200 - G203PublisherElectrochemical Society, Inc.

SCIESCOPUS

Thermal stability of ALD HfO2 thin films and interfacial layers on the oxynitride underlayer formed using remote plasma Go to Link

Kim, Seokhoon; Kim, Ju Youn; Kim, Jinwoo; Choi, Jihoon; Kang, Hyunseok; Bae, Choelhwyi; Jeon, Hyeongtag

ArticleIssue Date2005CitationElectrochemical and Solid-State Letters, v.9, no.2, pp G40 - G43PublisherElectrochemical Society, Inc.

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Browsing by Choi, JihoonAuthor

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